December 1, 1994 It's established as a IMPREX corporation. The countermeasure against static electricity for yield improvement of a semiconductor and each process Rhein in manufacturing process in a liquid crystal manufacturing factory mainly (obctrostatic control) And for stable supply realization of maintenance maintenance parts of each process unit. Business in the clean room of process structure is a main pillar daily. Production and sale of a semiconductor manufacturing equipment part are begun more than 1994 years. In December, 1995, Japanese exclusive agent conclusion of a contract with Applied Ceramics company (ACI). In October, 2002, Schunk. I conclude a contract with Semiconduntor company, from a market of Europe and America, Quartz, Silicon, Sapphire, Ceramic,Sic. SiN, ALN The system that a semiconductor manufacturing equipment part such as Hitoshi can be supplied directly is done. Since that, a project of supply business of the semiconductor manufacturing equipment part comes at present as a section with countermeasure against static electricity business and maintenance business with production of a semiconductor manufacturing equipment part and sales rapid sale in earnest. I advanced engineer's securement and preparations of a factory and came to factory operation from January, 2008 as contribution of a cost reduction of semiconductor manufacturing in 2007. I signed a contract as sales Japanese exclusive agent of a dry screw pump of Taiwanese HANBELL VACUUM and made sale and maintenance service start from September, 2013. Additionally I keep making an effort daily in order also to play the role as an overall repairing service firm of incidental equipment of semiconductor equipment. I make them move headquarters to Miyazaki with the last day of March, 2013, and it has started newly. |
インプレックス株式会社 / IMPREX
Inc.
〒889-1701 宮崎県宮崎市田野町甲6030-2 TEL :0985-86-3933 FAX
:0985-86-3934
6030-2 Tano-cho Miyazaki-shi Miyazaki 889-1701 Japan TEL
:+81-985-86-3933 FAX :+81-985-86-3934
・中央営業所
・高真空機器事業部(HVSD)
・Chuuou Branch ・High Vacuum System Div.